¼¼°èÀÇ ALD/high-k ±Ý¼Ó Àü±¸Ã¼ ½ÃÀå(Áß¿ä Àç·á)(2024-2025³â)
ALD / High K Metal Precursors Market Report 2024-2025 (Critical Materials Report)
»óǰÄÚµå
:
1498833
¸®¼Ä¡»ç
:
TECHCET
¹ßÇàÀÏ
:
2024³â 06¿ù
ÆäÀÌÁö Á¤º¸
:
¿µ¹® 170 Pages
¶óÀ̼±½º & °¡°Ý (ºÎ°¡¼¼ º°µµ)
»ùÇà ¿äû ¸ñ·Ï¿¡ Ãß°¡
ÀÌ º¸°í¼´Â ¹ÝµµÃ¼ µð¹ÙÀ̽º Á¦Á¶¿¡ »ç¿ëµÇ´Â Àü±¸Ã¼ ½ÃÀå Àü¸Á°ú °ø±Þ¸ÁÀ» ´Ù·ì´Ï´Ù. ¶ÇÇÑ ÁÖ¿ä °ø±Þ¾÷ü Á¤º¸, Àç·á °ø±Þ üÀÎ ¹®Á¦ ¹× µ¿Çâ, °ø±Þ¾÷ü ½ÃÀå Á¡À¯À² ÃßÁ¤ ¹× ¿¹Ãø, Àç·á ºÎ¹® ¿¹Ãø µîÀÇ Á¤º¸¸¦ °Ô½ÃÇÕ´Ï´Ù.
SAMPLE VIEW
¸ñÂ÷
Á¦1Àå ÁÖ¿ä ¿ä¾à
Á¦2Àå Á¶»ç ¹üÀ§,¸ñÀû,¼ö¹ý
Á¦3Àå ¹ÝµµÃ¼ »ê¾÷: ½ÃÀåÀÇ ÇöȲ°ú Àü¸Á
¼¼°è°æÁ¦¿Í Àü¸Á
¹ÝµµÃ¼ »ê¾÷°ú ¼¼°è °æÁ¦ÀÇ ¿¬°á
¹ÝµµÃ¼ ¸ÅÃâ ¼ºÀå
´ë¸¸ ¾Æ¿ô¼Ò½Ì Á¦Á¶¾÷üÀÇ ¿ù°£ ¸ÅÃâ µ¿Çâ
Ĩ ÆÇ¸Å µ¿Çâ : ÀüÀÚ Á¦Ç° ºÎ¹®º°
ÀÏ·ºÆ®·Î´Ð½ºÀÇ Àü¸Á
ÀÚµ¿Â÷ »ê¾÷ÀÇ Àü¸Á
½º¸¶Æ®ÆùÀÇ Àü¸Á
PCÀÇ Àü¸Á
¼¹ö/IT ½ÃÀå
¹ÝµµÃ¼ Á¦Á¶ÀÇ ¼ºÀå°ú È®´ë
Ĩ È®Àå¿¡ÀÇ °Å¾× ÅõÀÚÀÇ ÇѰ¡¿îµ¥
¹Ì±¹ÀÇ »õ·Î¿î °øÀå
¼¼°è °¢Áö¿¡¼ÀÇ °øÀå È®´ë°¡ ¼ºÀåÀ» °ßÀÎ
¼³ºñÅõÀÚ µ¿Çâ
°íµµ ·ÎÁ÷ÀÇ ±â¼ú ·Îµå¸Ê
°øÀå ÅõÀÚ Æò°¡
Á¤Ã¥,¹«¿ª µ¿Çâ°ú ±× ¿µÇâ
¹ÝµµÃ¼ Àç·áÀÇ °³¿ä
¿þÀÌÆÛÀÇ ÅõÀÔ ¸Å¼ö: ¿¹Ãø(-2028³â)
Àç·á ½ÃÀå ¿¹Ãø(-2028³â)
Á¦4Àå Àç·á ½ÃÀå µ¿Çâ
CVD,ALD ±Ý¼Ó ¹× high-k,°íµµ À¯Àüü Àü±¸Ã¼ ½ÃÀå µ¿Çâ
Àü±¸Ã¼ ½ÃÀå(2023³â) : 2024³â¿¡ÀÇ ¿¬°á
Àü±¸Ã¼ ½ÃÀå Àü¸Á
±Ý¼Ó ¹× high-k Àü±¸Ã¼ÀÇ ÃâÇÏ·®ÀÇ ¿¹Ãø : ºÎ¹®º°(ÇâÈÄ 5³â°£ ºÐ)
Àü±¸Ã¼°ø±Þ ´É·Â°ú ¼ö¿ä,ÅõÀÚ
ÁÖ¿ä °ø±ÞÀÚÀÇ ±Ý¼Ó ¹× high-k Àü±¸Ã¼ÀÇ »ý»ê ´É·Â
±Ý¼Ó ¹× high-kÀÇ »ý»ê·® : Áö¿ªº°
ALD/CVD Àç·áÀÇ »ý»ê ´É·Â È®´ë
ÅõÀÚ ¹ßÇ¥: °³¿ä
Àü±¸Ã¼ÀÇ ¼ö±Þ ¹ë·±½º: °³¿ä
°¡°Ý µ¿Çâ
±â¼ú µ¿Çâ/±â¼ú ÃËÁø¿äÀÎ: °³¿ä
Àü±¸Ã¼ÀÇ Àü¹ÝÀûÀÎ ±â¼ú °³¿ä:±â¼ú µ¿Çâ
°í°´ ÁÖµµÇü ±â¼ú
NAND ·Îµå¸Ê ¹× °úÁ¦: ½ºÅÃ/Ƽ¾î°¡ ÀÖ´Â 3D NAND ·¹º§
3D NAND ÇÁ·Î¼¼½ºÀÇ Áøº¸ÀÇ Çʿ伺
»õ·Î¿î Àç·á¿Í ¿¡Äª ÈÇÐÀÌ 3D NANDÀÇ ½ºÄÉÀϸµÀ» °¡´ÉÇÏ°Ô ÇÑ´Ù - PF3(G)¿Í MOO2CL2(S)
¸ô¸®ºêµ§ : ·¥ Á¶»ç¿¡ ÀÇÇÑ ¹ÝµµÃ¼ ¸ÞÅ»¶óÀÌÁ¦À̼ÇÀÇ »õ·Î¿î ÇÁ·ÐƼ¾î
DRAM ÇÁ·Î¼¼½ºÀÇ Áøº¸°¡ ÇÊ¿ä
DRAM ¹Ì·¡ÀÇ ±â¼ú°úÁ¦
MicronÀÌ È¹±âÀûÀÎ NVDRAMÀ» ¹ßÇ¥:DRAM¿¡ ÇÊÀûÇÏ´Â ¼º´ÉÀ» °¡Áö´Â µà¾ó ·¹À̾î 32±â°¡ºñÆ® ºñÈֹ߼º °À¯Àüü ¸Þ¸ð¸®
°íµµ ·ÎÁ÷ÀÇ ·Îµå¸Ê°ú °úÁ¦: ·ÎÁ÷ Æ®·£Áö½ºÅÍ EST. ·Îµå¸Ê
°í±Þ ·ÎÁ÷(ÆÄ¿îµå¸®) ³ëµå HVM ÃßÁ¤
ADV ·ÎÁ÷ ÇÁ·Î¼¼½ºÀÇ Áøº¸ÀÇ Çʿ伺
°íµµ ·ÎÁ÷: ¹Ì·¡ÀÇ ±â¼úÀû °úÁ¦
Æ÷Å丮¼Ò±×·¡ÇÇ¿¡ ÀÖ¾î¼ÀÇ ±â¼ú Áøº¸ÀÇ ¿µÇâ
CFET ¾ÆÅ°ÅØÃ³: CFET ½ºÄÉÀϸµÀÇ ÀåÁ¡
¹«±â EUV ·¹Áö½ºÆ®: ALD ÁõÂø
ºÐÀÚÃþ ÁõÂø(MLD)
¿µ¿ª ¼±ÅÃ Ä§Âø(ASD)
Ư¼ö/½ÅÈï±Ý¼Ó°ú ±× ¿ëµµ
Ư¼ö/½ÅÈï HIGH-K¿Í ±× ÀÀ¿ë
Áö¿ªÀû °í·Á»çÇ×: ±Ý¼Ó ¹× high-k
EHS¿Í ¹«¿ª/¹°·ù ¹®Á¦: ±Ý¼Ó ¹× high-k,À¯Àüü
ESH ±Ý¼Ó
ESHhigh-k
ESH ÀçȰ¿ë
¹«¿ª/¹°·ù ¹®Á¦: ±Ý¼ÓÀç·á
¹«¿ª/¹°·ù ¹®Á¦: high-k Àç·á
high-k ½ÃÀå µ¿Çâ¿¡ °üÇÑ ºÐ¼®°¡ÀÇ Æò°¡
±Ý¼Ó ½ÃÀå µ¿Çâ¿¡ °üÇÑ ºÐ¼®°¡ÀÇ Æò°¡
Á¦5Àå °ø±ÞÃø ½ÃÀåÀÇ Á¤¼¼
Àü±¸Ã¼ Àç·á ½ÃÀå Á¡À¯À²
ÃÖ±Ù ºÐ±â Ȱµ¿: MERCK
ÃÖ±Ù ºÐ±â Ȱµ¿ : AIR LIQUIDE
ÃÖ±Ù ºÐ±â Ȱµ¿: ENTEGRIS
ADEKA
±â¾÷ ÇÕº´,Àμö(M&A) Ȱµ¿°ú ÆÄÆ®³Ê½Ê
°øÀå Æó¼â
½Å±Ô ÁøÃâ±â¾÷
MSP°¡ TURBO II(TM) ±âȱ⸦ ¹ß¸Å : ¹ÝµµÃ¼ Á¦Á¶ÀÇ Â÷¼¼´ë È¿À²
»õ·Î¿î ZR Àü±¸Ã¼ ¿þÀÌÆÛ ½ºÄÉÀÏ ÀÌ»êÈÁö¸£ÄÚ´½¸·
¸ô¸®ºêµ§ ¹Ú¸·ÀÇ Áøº¸: »õ·Î¿î ¾×ü Àü±¸Ã¼°¡ ±â»ó ÅðÀûÀ» ÃËÁø
Hanwha, ¸Þ¸ð¸® ¿ëµµ¿ë ¸ô¸®ºêµ§ ÁõÂø ALD ÀåÄ¡¸¦ °ø±Þ
Á¦Á¶ Áß´ÜÀÇ ¿ì·Á°¡ ÀÖ´Â °ø±ÞÀÚ ¶Ç´Â ºÎǰ/Á¦Ç° ¶óÀÎ
¾Ö³Î¸®½ºÆ®¿¡ ÀÇÇÑ ¼±Çà °ø±ÞÀÚÀÇ Æò°¡
Á¦6Àå ÇÏÃþ °ø±Þ üÀÎ: Àü±¸Ã¼
ÇÏÃþ(¼ºêƼ¾î) °ø±Þ üÀÎ: °ø±Þ¿ø°ú ½ÃÀå °³¿ä
ÇÏÃþ °ø±Þ¸Á: °ø±Þ¿ø ¹× ½ÃÀå °³¿ä - Tier 2ÀÇ ¿¹: NOURYON°ú GELEST
ÇÏÃþ °ø±Þ¸Á: °ø±Þ¾÷ü ¹× ½ÃÀå °³¿ä - ÈÇÐ ¹× °¡½º °ü¸® ½Ã½ºÅÛ
ÇÏÃþ °ø±Þ¸Á: °ø±Þ¿ø ¹× ½ÃÀå °³¿ä - ÈÇй°Áú ¹è¼Û ijºñ´Ö
ÇÏÃþ °ø±Þ¸Á: °ø±Þ¿ø ¹× ½ÃÀå °³¿ä - ¹ëºê ¸Å´ÏÆúµå ¹Ú½º(VMB)
ÇÏÃþ °ø±Þ¸Á: °ø±Þ¿ø ¹× ½ÃÀå °³¿ä - ´ë·® »ç¾ç °¡½º ½Ã½ºÅÛ
ÇÏÃþ °ø±Þ¸Á: °ø±Þ¿ø ¹× ½ÃÀå °³¿ä - °¡½º ijºñ´Ö
ÇÏÃþ °ø±Þ¸Á: °ø±Þ¿ø ¹× ½ÃÀå °³¿ä - Æ÷¹Ö °¡½º¿Í µµÆÝÆ® °¡½º ºí·»´õ
ÇÏÃþ °ø±Þ¸Á: °ø±Þ¾÷ü ¹× ½ÃÀå °³¿ä: ÈÇÐ - ¸ð´ÏÅ͸µ ¹× ºÐ¼® ½Ã½ºÅÛ
ÇÏÃþ Àç·á : CVD?ALD Àü±¸Ã¼ÀÇ µ¿Çâ
ÇÏÃþ Àç·á : °ø¾÷¿ë vs ¹ÝµµÃ¼ ±×·¹À̵å
¹ÝµµÃ¼ µî±Þ ÇÏÃþ Àç·á °ø±Þ¾÷üÀÇ ±¹Á¦ ³×Æ®¿öÅ©: Merck
¹ÝµµÃ¼ µî±Þ ÇÏÃþ Àç·á °ø±Þ¾÷üÀÇ ±¹Á¦ ³×Æ®¿öÅ©: Air Liquide
¹ÝµµÃ¼ µî±ÞÀÇ ÇÏÃþ Àç·á °ø±Þ¾÷üÀÇ ÃֽŠÁ¤º¸
ÇÏÃþ °ø±Þ üÀÎÀÇ Çõ½Å(ÆÄ±«)
ÇÏÃþ °ø±Þ¸Á °øÀåÀÇ ÃֽŠÁ¤º¸
ÇÏÃþ °ø±Þ¸Á °øÀåÀÇ ÃֽŠÁ¤º¸ : HAFNIA¿Í REO(DUBBO PROJECT)
¹ÝµµÃ¼ »ê¾÷¿¡¼ »ç¿ëµÇ´Â ±¤¹°ÀÇ ÀÇÁ¸µµ
ÇÏÃþ °ø±Þ üÀÎÀÇ µ¿Çâ : ÄÚ¹ßÆ®
ÇÏÃþ °ø±Þ üÀÎÀÇ µ¿Çâ :Áö¸£ÄÚ´½,ÇÏÇÁ´½
ÇÏÃþ °ø±Þ üÀÎÀÇ µ¿Çâ : ÇÏÇÁ´½
ÇÏÃþ °ø±Þ üÀÎÀÇ µ¿Çâ : °¥·ý
¾Ë·ç¹Ì´½
ƼŸ´½
ÅÖ½ºÅÙ
¸ô¸®ºêµ§
´Ï¿Àºê?źŻ
ÈñÅä·ù(ÈñÅä·ù)
ÇÏÃþ °ø±Þ üÀÎÀÇ µ¿Çâ :PGM
ÇÏÃþ °ø±Þ üÀÎÀÇ µ¿Çâ :°Ô¸£¸¶´½
ÇÏÃþ °ø±Þ¸Á: ºÐ¼®°¡ÀÇ Æò°¡
Á¦7Àå °ø±ÞÀÚ ÇÁ·ÎÆÄÀÏ
ADEKA CORPORATION
AIR LIQUIDE(MAKER, PURIFIER, SUPPLIER)
AZMAX CO., LTD
CITY CHEMICAL LLC
DNF CO., LTD
±âŸ 20»ç ÀÌ»ó
BJH
¿µ¹® ¸ñÂ÷
This report covers the market landscape and supply-chain for Precursors used in semiconductor device fabrication. It includes information about key suppliers, issues/trends in the material supply chain, estimates on supplier market share, and forecast for the material segments.
SAMPLE VIEW
TABLE OF CONTENTS
1 EXECUTIVE SUMMARY
1.1 PRECURSORS BUSINESS - MARKET OVERVIEW
1.2 PRECURSORS MARKET TRENDS IMPACTING 2024 OUTLOOK
1.3 5-YEAR UNIT SHIPMENT FORECAST BY SEGMENT: METAL AND HIGH-K PRECURSORS
1.4 PRECURSOR TRENDS
1.5 PRECURSOR TECHNOLOGY TRENDS
1.6 COMPETITIVE LANDSCAPE METAL & HIGH-K PRECURSORS
1.7 PRECURSOR EHS, TRADE, AND/OR LOGISTICS ISSUES/CONCERNS
1.8 ANALYST ASSESSMENT OF METAL AND HIGH-K PRECURSORS
2 SCOPE, PURPOSE AND METHODOLOGY
2.1 SCOPE
2.2 METHODOLOGY
2.3 OVERVIEW OF OTHER TECHCET CMR(TM) OFFERINGS
3 SEMICONDUCTOR INDUSTRY MARKET STATUS & OUTLOOK
3.1 WORLDWIDE ECONOMY AND OUTLOOK
3.1.1 SEMICONDUCTOR INDUSTRIES TIES TO THE GLOBAL ECONOMY
3.1.2 SEMICONDUCTOR SALES GROWTH
3.1.3 TAIWAN OUTSOURCE MANUFACTURER MONTHLY SALES TRENDS
3.2 CHIPS SALES BY ELECTRONIC GOODS SEGMENT
3.2.1 ELECTRONICS OUTLOOK
3.2.2 AUTOMOTIVE INDUSTRY OUTLOOK
3.2.2.1 ELECTRIC VEHICLE (EV) MARKET TRENDS
3.2.2.2 INCREASE IN SEMICONDUCTOR CONTENT FOR AUTOS
3.2.3 SMARTPHONE OUTLOOK
3.2.4 PC OUTLOOK
3.2.5 SERVERS / IT MARKET
3.3 SEMICONDUCTOR FABRICATION GROWTH & EXPANSION
3.3.1 IN THE MIDST OF HUGE INVESTMENT IN CHIP EXPANSIONS
3.3.2 NEW FABS IN THE US
3.3.3 WW FAB EXPANSION DRIVING GROWTH
3.3.4 EQUIPMENT SPENDING TRENDS
3.3.5 ADVANCED LOGIC TECHNOLOGY ROADMAPS
3.3.5.1 DRAM TECHNOLOGY ROADMAPS
3.3.5.2 3D NAND TECHNOLOGY ROADMAPS
3.3.6 FAB INVESTMENT ASSESSMENT
3.4 POLICY & TRADE TRENDS AND IMPACT
3.5 SEMICONDUCTOR MATERIALS OVERVIEW
3.5.1 TECHCET WAFER STARTS FORECAST THROUGH 2028
3.5.2 TECHCET MATERIALS MARKET FORECAST THROUGH 2028
4 MATERIAL MARKET TRENDS
4.1 CVD, ALD METAL & HIGH-K AND ADVANCED DIELECTRIC PRECURSORS MARKET TRENDS
4.1.1 2023 PRECURSOR MARKET LEADING INTO 2024
4.1.2 PRECURSOR MARKET OUTLOOK
4.1.3 METAL AND HIGH-K PRECURSORS 5-YEAR UNIT SHIPMENT FORECAST BY SEGMENT
4.2 PRECURSORS SUPPLY CAPACITY AND DEMAND, INVESTMENTS
4.2.1 METAL & HIGH-K PRECURSOR PRODUCTION CAPACITY OF TOP SUPPLIERS
4.2.2 METAL & HIGH-K PRODUCTION BY REGION
4.2.3 ALD/CVD MATERIAL PRODUCTION CAPACITY EXPANSIONS
4.2.4 INVESTMENT ANNOUNCEMENTS OVERVIEW
4.2.5 PRECURSORS SUPPLY VS. DEMAND BALANCE - OVERVIEW
4.3 PRICING TRENDS
4.4 TECHNOLOGY TRENDS/TECHNICAL DRIVERS - OUTLINE
4.4.1 PRECURSOR GENERAL TECHNOLOGY OVERVIEW & TECHNOLOGY TRENDS
4.4.2 CUSTOMER DRIVEN TECHNOLOGIES
4.4.3 NAND ROADMAPS AND CHALLENGES - 3D NAND LEVELS W/ STACKS/TIERS
4.4.4 3D NAND PROCESS ADVANCES REQUIRED
4.4.5 NEW MATERIALS AND ETCH CHEMISTRIES ENABLE 3D NAND SCALING - PF3(G) AND MOO2CL2(S)
4.4.6 MOLYBDENUM: THE NEW FRONTIER IN SEMICONDUCTOR METALLIZATION ACCORDING TO LAM RESEARCH
4.4.7 DRAM PROCESS ADVANCES REQUIRED
4.4.8 DRAM FUTURE TECHNOLOGY CHALLENGES
4.4.9 MICRON UNVEILS BREAKTHROUGH NVDRAM: A DUAL-LAYER 32GBIT NON-VOLATILE FERROELECTRIC MEMORY WITH NEAR-DRAM PERFORMANCE
4.4.10 ADVANCED LOGIC ROADMAPS AND CHALLENGES - LOGIC TRANSISTOR EST. ROADMAP
4.4.11 ADVANCED LOGIC (FOUNDRY) NODE HVM ESTIMATE
4.4.12 ADV LOGIC PROCESS ADVANCES REQUIRED
4.4.12.1 THE SEMICONDUCTOR SHOWDOWN: SAMSUNG AND TSMC'S GAA FETS VS. INTEL'S RIBBONFET
4.4.13 ADV LOGIC FUTURE TECHNOLOGY CHALLENGES
4.4.14 ADVANCING TECHNOLOGIES IMPLICATION TO PHOTOLITHOGRAPHY
4.4.14.1 ADVANCING TECHNOLOGIES IMPLICATION TO PHOTOLITHOGRAPHY - DSA
4.4.14.2 ADVANCING TECHNOLOGIES IMPLICATION TO PHOTOLITHOGRAPHY: CENTURA SCULPTA BY APPLIED MATERIALS: SHAPING THE FUTURE OF SEMICONDUCTOR MANUFACTURING
4.4.14.3 ADVANCING TECHNOLOGIES IMPLICATION TO PHOTOLITHOGRAPHY: LINE EDGE ROUGHNESS REDUCTION THRU DEPOSITION
4.4.15 CFET ARCHITECTURE: CFET SCALING ADVANTAGE
4.4.15.1 CFET ARCHITECTURE: COMPLEMENTARY FETS (CFETS)
4.4.15.2 CFET ARCHITECTURE: CFET FUTURE PROSPECTS
4.4.16 INORGANIC EUV RESIST - ALD DEPOSITED
4.4.17 MOLECULAR LAYER DEPOSITION (MLD)
4.4.17.1 TREND IS MLD COMBINED WITH ALD
4.4.17.2 DIFFERENT TYPES OF MLD PRECURSORS AND MATERIALS
4.4.17.3 MLD APPLICATIONS
4.4.18 AREA SELECTIVE DEPOSITION (ASD)
4.4.18.1 AREA SELECTIVE DEPOSITION (ASD) - ADEKA PRESENT ASD HF-PRECURSOR
4.4.18.2 AREA SELECTIVE DEPOSITION (ASD) - TU EINDHOVEN SELECTIVE ALD ENABLED BY PLASMA PRETREATMENT
4.4.20 SPECIALTY/EMERGING METAL AND APPLICATIONS
4.4.21 SPECIALTY/EMERGING HIGH-K AND APPLICATIONS
4.5 REGIONAL CONSIDERATIONS - METAL AND HIGH-K
4.5.1 REGIONAL ASPECTS AND DRIVERS
4.6 EHS AND TRADE/LOGISTIC ISSUES - METALS, HIGH-K AND DIELECTRICS
4.6.1 ESH METALS
4.6.2 ESH HIGH-K
4.6.3 ESH RECYCLING
4.7 TRADE/LOGISTICS ISSUES - METAL MATERIALS
4.7.1 TRADE/LOGISTICS ISSUES - HIGH-K MATERIALS
4.8 ANALYST ASSESSMENT OF HIGH-K MARKET TRENDS
4.8.1 ANALYST ASSESSMENT OF METAL MARKET TRENDS
5 SUPPLY-SIDE MARKET LANDSCAPE
5.1 PRECURSOR MATERIAL MARKET SHARE
5.1.1 CURRENT QUARTER ACTIVITY - MERCK
5.1.2 CURRENT QUARTER ACTIVITY - AIR LIQUIDE
5.1.3 CURRENT QUARTER ACTIVITY -ENTEGRIS
5.1.4 ADEKA
5.2 M&A ACTIVITY AND PARTNERSHIPS
5.3 PLANT CLOSURES
5.4 NEW ENTRANTS
5.4.1 MSP LAUNCHES TURBO II(TM) VAPORIZERS: NEXT-GEN EFFICIENCY FOR SEMICONDUCTOR FABRICATION
5.4.2 A NEW ZR PRECURSOR WAFER-SCALE ZIRCONIUM DIOXIDE FILMS
5.4.3 ADVANCES IN MOLYBDENUM THIN FILMS: NEW LIQUID PRECURSORS BOOST VAPOR PHASE DEPOSITION
5.4.4 HANWHA TO SUPPLY ALD EQUIPMENT FOR MOLYBDENUM DEPOSITION FOR MEMORY APPLICATIONS
5.5 SUPPLIERS OR PARTS/PRODUCT LINES THAT ARE AT RISK OF DISCONTINUATIONS
5.6 TECHCET ANALYST ASSESSMENT OF PRECURSOR SUPPLIERS
6 SUB-TIER SUPPLY-CHAIN, PRECURSORS
6.1 SUB-TIER SUPPLY CHAIN: SOURCES & MARKETS OVERVIEW
6.1.1 SUB-TIER SUPPLY CHAIN: SOURCES & MARKETS OVERVIEW - TIER 2 EXAMPLES NOURYON AND GELEST
6.1.2 SUB-TIER SUPPLY CHAIN: SOURCES & MARKETS OVERVIEW - CHEMICAL & GAS MANAGEMENT SYSTEMS
6.1.3 SUB-TIER SUPPLY CHAIN: SOURCES & MARKETS OVERVIEW - CHEMICAL DELIVERY CABINETS
6.1.4 SUB-TIER SUPPLY CHAIN: SOURCES & MARKETS OVERVIEW VALVE MANIFOLD BOXES (VMB)
6.1.5 SUB-TIER SUPPLY CHAIN: SOURCES & MARKETS OVERVIEW - BULK SPEC GAS SYSTEMS
6.1.6 SUB-TIER SUPPLY CHAIN: SOURCES & MARKETS OVERVIEW - GAS CABINETS
6.1.7 SUB-TIER SUPPLY CHAIN: SOURCES & MARKETS OVERVIEW - FORMING GAS & DOPANT GAS BLENDERS
6.1.8 SUB-TIER SUPPLY CHAIN: SOURCES & MARKETS OVERVIEW CHEMICAL - MONITORING AND ANALYTICAL SYSTEMS
6.2 SUB-TIER MATERIAL CVD & ALD PRECURSOR TRENDS
6.3 SUB-TIER MATERIAL INDUSTRIAL VS. SEMICONDUCTOR-GRADE
6.4 SEMICONDUCTOR-GRADE SUB-TIER MATERIAL SUPPLIER GLOBAL NETWORK MERCK
6.5 SEMICONDUCTOR-GRADE SUB-TIER MATERIAL SUPPLIER GLOBAL NETWORK AIR LIQUIDE
6.6 SEMICONDUCTOR-GRADE SUB-TIER MATERIAL SUPPLIER NEWS
6.7 SUB-TIER SUPPLY-CHAIN: DISRUPTIONS
6.8 SUB-TIER SUPPLY-CHAIN PLANT UPDATES
6.9 SUB-TIER SUPPLY-CHAIN PLANT UPDATES - HAFNIA AND REO FROM THE DUBBO PROJECT
6.10 MINERAL USED IN THE SEMICONDUCTOR INDUSTRY DEPENDENCIES
6.11 SUB-TIER SUPPLY-CHAIN PRICING TRENDS - COBALT
6.12 SUB-TIER SUPPLY-CHAIN PRICING TRENDS: ZIRCONIUM AND HAFNIUM
6.13 SUB-TIER SUPPLY-CHAIN PRICING TRENDS - HAFNIUM
6.14 SUB-TIER SUPPLY-CHAIN PRICING TRENDS - GALLIUM
6.15 ALUMINUM
6.16 TITANIUM
6.17 TUNGSTEN
6.18 MOLYBDENUM
6.19 NIOBIUM AND TANTALUM
6.20 RARE EARTHS
6.21 SUB-TIER SUPPLY-CHAIN PRICING TRENDS - PGM
6.22 SUB-TIER SUPPLY-CHAIN PRICING TRENDS - GERMANIUM
6.23 SUB-TIER SUPPLY-CHAIN TECHCET ANALYST ASSESSMENT
7 SUPPLIER PROFILES
ADEKA CORPORATION
AIR LIQUIDE (MAKER, PURIFIER, SUPPLIER)
AZMAX CO., LTD
CITY CHEMICAL LLC
DNF CO., LTD
...AND 20+ MORE
FIGURES
FIGURE 1.1: METAL & HIGH-K PRECURSOR REVENUE (M USD) FORECAST BY SEGMENT
FIGURE 1.2: WW MARKET SHARE - METAL & HIGH-K PRECURSORS 2023 (U$ 811 M)
FIGURE 3.1: GLOBAL ECONOMY AND THE ELECTRONICS SUPPLY CHAIN (2023)
FIGURE 3.2: WORLDWIDE SEMICONDUCTOR SALES
FIGURE 3.3: TECHCET'S TAIWAN SEMICONDUCTOR INDUSTRY INDEX (TTSI)
FIGURE 3.4: 2023 SEMICONDUCTOR CHIP APPLICATIONS
FIGURE 3.5: GLOBAL LIGHT VEHICLE UNIT SALES (IN MILLIONS OF UNITS)
FIGURE 3.6: ELECTRIFICATION TREND BY WORLD REGION
FIGURE 3.7: AUTOMOTIVE SEMICONDUCTOR PRODUCTION
FIGURE 3.8: MOBILE PHONE SHIPMENTS, WW ESTIMATES
FIGURE 3.9: WORLDWIDE PC AND TABLET FORECAST
FIGURE 3.10: TSMC PHOENIX CAMPUS WITH THE 2ND FAB VISIBLE IN THE BACKGROUND
FIGURE 3.11: ESTIMATED GLOBAL FAB SPENDING 2023-2028
FIGURE 3.12: FAB EXPANSIONS WITHIN THE US
FIGURE 3.13: SEMICONDUCTOR CHIP MANUFACTURING REGIONS OF THE WORLD
FIGURE 3.14: GLOBAL TOTAL EQUIPMENT SPENDING (US$ M) AND Y-O-Y CHANGE
FIGURE 3.15: ADVANCED LOGIC DEVICE TECHNOLOGY ROADMAP OVERVIEW
FIGURE 3.16: DRAM TECHNOLOGY ROADMAP OVERVIEW
FIGURE 3.17: 3D NAND TECHNOLOGY ROADMAP OVERVIEW
FIGURE 3.18: INTEL OHIO PLANT SITE AS OF FEB. 2024
FIGURE 3.19: TECHCET WAFER START FORECAST BY NODE SEGMENTS
FIGURE 3.20: TECHCET WORLDWIDE MATERIALS FORECAST ($M USD)
FIGURE 4.1: METAL & HIGH-K PRECURSOR REVENUE (M USD) FORECAST BY SEGMENT
FIGURE 4.2: MEMORY SUPPLY/DEMAND SITUATION 2024
FIGURE 4.3: WW MARKET SHARE - METAL & HIGH-K PRECURSORS 2023 (U$ 811 M)
FIGURE 4.4: REGIONAL MARKET SHARES
FIGURE 4.5: END USE APPLICATIONS DRIVING NEW DEVICE PROCESSES
FIGURE 4.6: 3D NAND STACKING DRIVES DIELECTRICS AND METALS PRECURSOR VOLUME
FIGURE 4.7: 3D NAND PROGRESSION
FIGURE 4.8: ETCH DEPTH PERFORMANCE
FIGURE 4.9: TOKYO ELECTRON'S NEW CRYOGENIC ETCH TOOL
FIGURE 4.10: DRAM MESH BY MICRON
FIGURE 4.11: IMEC CAPACITORLESS IGZO CELL FOR 3D STACKED DRAM
FIGURE 4.12: TRANSITION FROM 2D TO 3D DRAM
FIGURE 4.13: 32 GB NVDRAM WITH 1T 1C MEMORY LAYERS
FIGURE 4.14: GATE STRUCTURE ROADMAP
FIGURE 4.15: ADVANCED LOGIC (FOUNDRY) NODE ROAD MAP
FIGURE 4.16: LOGIC TRANSISTOR PROGRESSION
FIGURE 4.17: RIBBON FET
FIGURE 4.18: MONO LAYER NANO SHEETS CHANNELS
FIGURE 4.19: NANO IMPRINT LITHOGRAPHY PROCESS FLOW
FIGURE 4.20: ALD/ALE ENHANCEMENT OF NANO IMPRINT LITHOGRAPHY
FIGURE 4.21: DIRECTED SELF-ASSEMBLY
FIGURE 4.22: DSA PATENT FILING BY COMPANY
FIGURE 4.23: DSA PATEN FILING SINCE 2023
FIGURE 4.24: WHAT IS PATTERN SHAPING?
FIGURE 4.25: REFINING EUV PATTERNING BY APPLIED MATERIALS
FIGURE 4.26: COMPLEMENTARY FET (CFET)
FIGURE 4.27: CFET IMPROVES PERFORMANCE IN TRACK SCALING
FIGURE 4.28: MONOLITHIC CFET PROCESS FLOW EXAMPLE
FIGURE 4.29: MCFET NEW FEATURE: MIDDLE DIELECTRIC ISOLATION
FIGURE 4.30: LOW TEMPERATURE GATE STACK OPTION EXAMPLES
FIGURE 4.31: LOW TEMPERATURE SD/CONTACT OPTION EXAMPLES
FIGURE 4.32: BSPDN ADVANTAGE: IR DROP REDUCTION
FIGURE 4.33: INCREASING NUMBER OF ALD STEPS REQUIRED BY NEXT GENERATION GAA-FET AND CFET
FIGURE 4.34: IMEC SUB-1NM TRANSISTOR ROADMAP, 3D-STACKED CMOS 2.0 PLANS
FIGURE 4.35: PATENT FILING FOR MLD DEPOSITED EUV RESIST - SEARCH PERFORMED IN PATBASE
FIGURE 4.36: MOLECULAR LAYER DEPOSITION VS ATOMIC LAYER DEPOSITION
FIGURE 4.37: INCREASING TREND OF ALD/MLD PUBLICATIONS
FIGURE 4.38: ADEKA ASD-HF PRECURSORS
FIGURE 4.39: SELECTIVE ALD ENABLED BY PLASMA PRETREATMENT
FIGURE 4.40: SPECIALTY/EMERGING METAL APPLICATIONS
FIGURE 4.41: SPECIALTY/EMERGING HIGH-K APPLICATIONS - NVM DRAM (MICRON IEDM2023)
FIGURE 4.42: 2023 METAL & HIGH-K REVENUE SHARE BY REGION
FIGURE 4.43: EHS ISSUES - HIGH-K: MINING IN CHINA
FIGURE 4.44: SK HYNIX'S RECYCLED AND RENEWABLE MATERIALS TARGETS
FIGURE 5.1: 2023 PRECURSOR MATERIAL SUPPLIER MARKET SHARE BY REVENUE
FIGURE 5.2: MERCK ELECTRONICS REVENUE 2022-2023 (M EUR), LEFT - SEMICONDUCTOR SOLUTIONS ANNUAL REVENUE FORECAST (M EUR), RIGHT
FIGURE 5.3: AIR LIQUIDE ELECTRONICS REVENUE FORECAST (M EUR)
FIGURE 5.4: THE MS (MATERIAL SOLUTIONS) DIVISION OF ENTEGRIS REVENUE FORECAST
FIGURE 5.5: ADEKA REVENUE ELECTRONICS REVENUE FORECAST (100M JPY)
FIGURE 5.6: NEW ZIRCONIUM PRECURSOR CLASS
FIGURE 5.7: ADVANCES IN MOLYBDENUM THIN FILMS: NEW LIQUID PRECURSORS BOOST VAPOR PHASE DEPOSITION
FIGURE 6.1: FORMING GAS BLENDER CONFIGURATION
FIGURE 6.2: TOP COUNTRIES/REGIONS THAT SUPPLY VERSUM MATERIALS US LLC (PANJIVA APRIL 2024)
FIGURE 6.3: TOP COUNTRIES/REGIONS THAT SUPPLY AIR LIQUIDE AMERICA CORP. (PANJEIVA APRIL 2024)
FIGURE 6.4: TOP COUNTRIES/REGIONS THAT SUPPLY H.C. STARCK INC. (USA)
FIGURE 6.5: PRICE TREND IN COBALT
FIGURE 6.6: HAFNIUM 5-YEAR PRICING
FIGURE 6.7: GALLIUM PRICE, 5 YEAR HISTORICAL
FIGURE 6.8: RUTHENIUM AND PLATINUM, 5-YEAR HISTORICAL PRICING
FIGURE 6.9: GERMANIUM PRICE, 5-YEAR HISTORICAL
TABLES
TABLE 1.1: METAL AND HI-K PRECURSORS REVENUES AND GROWTH RATES
TABLE 1.2: ESTIMATED METAL AND HIGH-K PRECURSOR MARKET SHARE BY SUPPLIER 2023
TABLE 3.1: GLOBAL GDP AND SEMICONDUCTOR REVENUES
TABLE 3.2: WORLD BANK ECONOMIC OUTLOOK (JANUARY 2024)
TABLE 3.3: BATTERY ELECTRIC VEHICLE (BEV) REGIONAL TRENDS
TABLE 3.4: DATA CENTER SYSTEMS AND COMMUNICATION SERVICES MARKET SPENDING 2023
TABLE 4.1: PRECURSORS REVENUE AND GROWTH RATES
TABLE 4.2: METAL AND HI-K PRECURSORS REVENUES AND GROWTH RATES
TABLE 4.3: ESTIMATED METAL AND HIGH-K PRECURSOR MARKET HARE BY SUPPLIER 2023
TABLE 4.4: METAL & HIGH-K PRECURSOR MARKET REGIONAL ASSESSMENT 2023
TABLE 4.5: OVERVIEW OF ANNOUNCED 2023/2024 MATERIAL SUPPLIER INVESTMENTS
TABLE 4.6: LEADING EDGE LOGIC DESCRIPTIONS BY NODE (TSMC, INTEL)
TABLE 4.7: SELECTIVE DEPOSITION - SELECTIVELY DEPOSITED MATERIALS
TABLE 4.8: REGIONAL PRECURSOR MATERIAL MARKETS
TABLE 4.9: REGIONAL PRECURSOR MATERIAL MARKETS, CONTINUED
TABLE 5.1: MERCK QUARTER FINANCIALS
TABLE 5.2: AIR LIQUIDE CURRENT QUARTER FINANCIALS
TABLE 5.3: ENTEGRIS SUPPLIER CURRENT QUARTER FINANCIALS
TABLE 6.1: CVD AND ALD PRECURSOR
TABLE 6.2: ORIGIN OF MINERALS USED TO MAKE PRECURSORS
TABLE 6.3: COBALT MINING AND PRODUCTION BY LOCATION
TABLE 6.4: ZIRCONIUM AND HAFNIUM MINERAL PRODUCTION BY LOCATION
TABLE 6.5: GALLIUM MINERAL PRODUCTION DESCRIPTION AND DEPENDENCIES
TABLE 6.6: ALUMINUM MINERAL REFINING AND PRODUCTION BY LOCATION
TABLE 6.7: TITANIUM ORE (ILMENITE AND RUTILE) PRODUCTION LOCATIONS
TABLE 6.8: TUNGSTEN ORE PRODUCTION BY LOCATION
TABLE 6.9: MOLYBDENUM PRODUCTION AND IMPORT AND EXPORTS
TABLE 6.10: MOLYBDENUM PRODUCTION DESCRIPTIONS
TABLE 6.11: NIOBIUM AND TANTALUM PRODUCTION BY LOCATION
TABLE 6.12: RARE EARTHS PRODUCTION BY LOCATION, I.E. LANTHANUM
TABLE 6.13: PGM PRODUCTION BY LOCATION
TABLE 6.14: GERMANIUM APPLICATIONS BY PERCENTAGE VOLUME
°ü·ÃÀÚ·á